Professor

Masaru Nakagawa

Associate Professor

Tomoya Oshikiri

Associate Professor

Hideyuki Mitomo

Assistant Professor

Hiromasa Niinomi

Photo-functional material science based on metasites fabricated by nanoimprint lithography

Nakagawa group conducts research on materials and processes for mold-using nanoimprint technology, one of the next-generation fundamental nanofabrication technologies in manufacturing. Using our developed resist materials and alignment and nanolithography processes, we fabricate metallic and dielectric nanostructures strictly as design and investigate the optical, photochemical, and physical interactions of molecules with the nanostructures and nano-clearances between/among nanostructures. Herein we propose and pursue "metasite" as an artificially created nano-clearance with nanometer sizes using the arrangement of metallic and dielectric nanostructures, where unprecedented chemical reactions and physical phenomena occur at hot spots of the nano-clearance.

Themes

• Single-digit-nanometer figuration by development of resist materials and alignment technology in UV nanoimprinting
• Development of nanolithography process using laser-drilled screen printing
• Alignment and building by fluorescence and scattering
• Creation of fields for photochemical reaction and self-assembly control by controlled/modulated near-field on metallic and dielectric nanostructures
• Development of measurement technology for physical property using nanostructures